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Micro-Nano fabrication Technologies
Date:Jun 1, 2018    Author:

Course No.: 012042

Course Category: elective course of subject

Period/Credits: 32/2

Prerequisite: Advance Mathematics, Complex Function Foundation, Mathematical Statistics, College Physics, Electromagnetic Field Theory, Semiconductor Technology, and so on.  

Aims & Requirements: 

This course is an optional course for all master's degree students. It is necessary for students who want to work on micro-nano processing in the future. Through this course, students can learn more about the micro-nano processing technology for VLSI production, MEMS manufacturing, and nanotechnology research.

Primary Coverage

Chapter 1: Introduction

Micro-nano technology and micro/nano processing technology; basic process and classification of micro/nano processing

Chapter 2: Optical Exposure Technology

Optical exposure methods and principles; optical exposure process; characteristics of photoresist; design and manufacture of optical masks; short wavelength exposure technology; large numerical aperture and immersion exposure technology; optical exposure resolution enhancement technology;

Chapter 3: Electron Beam Exposure Technology

Electron optics principle; electron beam exposure system; electron beam exposure pattern design and data format; electron beam resist and its process

Chapter 4: Focused Ion Beam Processing Technology

Liquid metal ion source; focused ion beam system; scattering of ions in solid materials; principle of focused ion beam processing; application of focused ion beam processing technology; focused ion beam exposure technology; ion beam projection exposure technology;

Chapter 5: Scanning Probe Processing Technology

Scanner Probe Microscope Principles; Resist Exposure Processing; Oxidative Local Processing; Additive Nanofabrication; Extraction Nano-processing; High Yield Scanning Probe Processing

Chapter 6: Replication Technology

Hot-press nanoimprint technology; room temperature nanoimprint technology; UV-curable nanoimprint technology; nano-transfer technology; soft lithography technology; large area continuous imprint technology

 

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